Fabrication of multi-electrode array system by micropen-laser hybrid direct writing technology

曹宇,刘建国,曾晓雁
DOI: https://doi.org/10.3785/j.issn.1008-973X.2012.06.007
2012-01-01
Abstract:Because of the dependence on lithography mask, traditional silicon micro-machining technology has the disadvantage of low flexibility. Using fused quartz/gold as the substrate/electrode material system, a multi-electrode array system with backside local area temperature control circuit was fabricated by the micropen-laser hybrid direct writing technology. The experimental results show that the gold electrode's resistivity is 1.2×10 -6 Ω·cm with 44 μm line-width and 12 μm film thickness, and the electrode impedance decreases with the frequency increases. In low frequency for capacitive reactance characteristics, its impedance repeatability is satisfying for the accuracy of the multi-electrode array. The resistance of the circular heating resistor in the local area temperature control circuit has good linear control from 15 to 28 V. The thermistor has the temperature coefficient of resistance (TCR) value of 2805×10 -6 /° within in the scope of 15.0-80.0°C, which can meet the application requirements.
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