Superhydrophobic ZnO for EWOD Digital Microfluidic Device for Application in Micro Total Analysis System (Μ-Tas)

J. Zhou,S. Yang,X. Y. Zeng,J. H. Wu,G. P. Chen,Y. P. Huang
DOI: https://doi.org/10.1163/156856111x600451
IF: 2.431
2012-01-01
Journal of Adhesion Science and Technology
Abstract:In this paper, we present a nanostructured ZnO based superhydrophobic high dielectric constant ( K) composite dielectric for EWOD digital microfluidic device for application in mu-TAS. Two fabrication methods of nannosturctured ZnO superhydrophobic surface are studied. Through electrochemical deposition, a nanostructured ZnO film with a dielectric constant of 6.21 and a maximum contact angle of 158.9 degrees is achieved. To prevent electrical leakage, a high dielectric constant barrier is combined with hydrothermal synthesis of ZnO nanorods. The contact angle reaches 164.8 degrees on the composite surface with a contact angle hysteresis of 11.3 degrees. Enhancement of optical signal detected on the superhydrophobic layer is demonstrated. Using such superhydrophobic high K composite material in EWOD digital microfluidics for application in mu-TAS is proposed and has shown its potential feasibility. (C) Koninklijke Brill NV, Leiden, 2011
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