Factors affecting formation of deethyl and deisopropyl products from atrazine degradation in UV/H2O2 and UV/PDS
Congwei Luo,Jin Jiang,Chaoting Guan,Jun Ma,Suyan Pang,Yang Song,Yi Yang,Jianqiao Zhang,Daoji Wu,Yinghong Guan
DOI: https://doi.org/10.1039/c7ra03660d
IF: 4.036
2017-01-01
RSC Advances
Abstract:In this study, the formation of deethyl products (DEPs) (i.e., atrazine amide (Atra-imine) and deethylatrazine (DEA)) and deisopropyl product (i.e., deisopropylatrazine (DIA)) from parent atrazine (ATZ) degraded in UV/H2O2 and UV/PDS processes under various conditions was monitored. It was found that SO4 center dot- displayed a more distinctive preference to the ethyl function group of ATZ than HO center dot, leading to the higher ratio of DEPs/DIA in UV/PDS system than that in UV/H2O2 system in pure water. The effects of water matrices (i.e., natural organic matter (NOM), carbonate/bicarbonate (HCO3-/CO32-), and chloride ions (Cl-)) on ATZ degradation as well as formation of DEPs and DIA were evaluated in detail. The degradation of ATZ by UV/PDS was significantly inhibited in the presence of NOM, HCO3/CO32 or Cl , because these components could competitively react with SO4 center dot- and/or HO center dot to generate lower reactive secondary radicals (i.e., organic radicals, carbonate radicals (CO3 center dot-) or reactive chlorine radicals (RCs)). The yields of these DEPs and DIA products from ATZ degradation were not impacted by NOM or HCO3-/CO32-, possibly due to the low reactivity of organic radicals and CO3 center dot- toward the side groups of ATZ. Howbeit, the increase of DIA yield companied with the decrease of DEPs yield was interestingly observed in the presence of Cl-, which was attributed to the promotion of Cl- at moderate concentration (mM range) for the conversion of SO4 center dot- into HO center dot. Comparatively, in the UV/H2O2 process, NOM and HCO3-/CO32- exhibited a similar inhibitory effect on ATZ degradation, while the influence of Cl- was negligible. Differing from UV/PDS system, all these factors did not change DEPs and DIA yields in UV/H2O2 process. Moreover, it was confirmed that RCs had a greater selectivity but a lower reactivity on attacking the ethyl function group than that of SO4 center dot-. These findings were also confirmed by monitoring the degradation of ATZ as well as the formation of DEPs and DIA in three natural waters.