3D Reconstruction of lithography simulation micro-structure based on MC Algorithm

GONG Shan-shan,LI Mu-jun
2012-01-01
Abstract:To simulate the shape of micro-structure in the deep lithography,three-dimensional reconstruction of light field data from theoretical calculation is needed.MC(Marching Cubes) algorithm is one of the most representative methods for constructing iso-surface in three-dimensional reconstruction.Based on MC algorithm,this paper first introduced the use of MC algorithm to draw the iso-surface of three-dimensional field data,and then analyze methods to cap the holes generated by the iso-surface and its boundary. Finally,the parametric design language of finite element analysis software is studied to convert the surface model into solid model. The reconstructed geometric model can not only be used for the shape error analysis of micro-structure,but also facilitate the establishment of the finite element model,which will be directly applied in finite element analysis.
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