Abstract:Functioning both as electrochromic (EC) and transparent-conductive (TC) coatings, WO3/Ag/WO3 (WAW) trilayer film shows promising potential application for ITO-free electrochromic devices. Reports on thermal-evaporated WAW films revealed that these bifunctional WAW films have distinct EC characteristics; however, their poor adhesive property leads to rapid degradation of coloring-bleaching cycling. Here, we show that WAW film with improved EC durability can be prepared by reactive sputtering using metal targets. We find that, by introducing an ultrathin tungsten (W) sacrificial layer before the deposition of external WO3, the oxidation of silver, which leads to film insulation and apparent optical haze, can be effectively avoided. We also find that the luminous transmittance and sheet resistance were sensitive to the thicknesses of tungsten and silver layers. The optimized structure for TC coating was obtained to be WO3 (45 nm)/Ag (10 nm)/W (2 nm)/WO3 (45 nm) with a sheet resistance of 16.3 Ω/□ and a luminous transmittance of 73.7%. Such film exhibits compelling EC performance with decent luminous transmittance modulation ΔTlum of 29.5%, fast switching time (6.6 s for coloring and 15.9 s for bleaching time), and long-term cycling stability (2000 cycles) with an applied potential of ±1.2 V. Thicker external WO3 layer (45/10/2/100 nm) leads to larger modulation with maximum ΔTlum of 46.4%, but at the cost of significantly increasing the sheet resistance. The strategy of introducing ultrathin metal sacrificial layer to avoid silver oxidation could be extended to fabricating other oxide-Ag-oxide transparent electrodes via low-cost reactive sputtering.

Fabrication and Electrochromic Properties of Double Layer WO3(V)/V2O5(Ti) Thin Films Prepared by Pulsed Laser Ablation Technique

Electrochromism of titanium oxide thin films

Orientated Growth of V2o5 Electrochromic Thin Films on Transparent Conductive Glass by Pulsed Excimer Laser Ablation Technique

Improved Stability of Electrochromic Devices Using Ti-doped V2O5 Film

Reactive Sputter Deposition of WO3/Ag/WO3 Film for Indium Tin Oxide (ITO)-Free Electrochromic Devices

Improvement of Electrochromic Performance by Embedding ITO Nanocrystals in Amorphous WO3 Film

Electrochromic WO3 thin films attain unprecedented durability by potentiostatic pretreatment

Preparation and Electrochromic Properties of Nanocrystalline WO3 Thin Films Prepared by Pulsed Excimer Laser Ablation Technique

Construction of TiO2/WO3/TiO2 double heterojunction films for excellent electrochromic performance

Study on the Structure and Electrochromism of WO<sub>3</sub> and Ti-Doped WO<sub>3</sub> Films

Excellent Electrochromic Properties of Ti4+-Induced Nanowires V2O5 Films

Electrochromic Properties of Sol-Gel Deposited V2o5 and Tio2-V2o5 Binary Thin Films

Electrochromic Properties of WOx -Ti Films

Layer-Controlled Synthesis Of Wo3 Ordered Nanoporous Films For Optimum Electrochromic Application

Layer-controlled Synthesis of WO₃ Ordered Nanoporous Films for Optimum Electrochromic Application.

Structural Characterization and Electrical and Optical Properties of V2o5 Films Prepared Via Ultrasonic Spraying

Two-Dimensional V2O5 Inverse Opal: Fabrication and Electrochromic Application

STRUCTURAL EFFECT OF VANADIUM PENTOXIDE FILMS ON THE ELECTROCHROMIC PROPERTIES

Electrochromic Films with a Stacked Structure of WO3 Nanosheets

Highly Robust and Flexible WO3·2H2O/PEDOT Films for Improved Electrochromic Performance in Near-Infrared Region

Lithiation and electrochromic characteristics of composite Ta2O5-TiO2 films fabricated by ultraviolet reactive laser ablation