The Effect of Silicon Sources on the Mechanism of Phosphorus–silicon Synergism of Flame Retardation of Epoxy Resins

YL Liu,CI Chou

DOI: https://doi.org/10.1016/j.polymdegradstab.2005.04.004

IF: 5.204

2005-01-01

Polymer Degradation and Stability

Abstract:The effect of silicon source on the mechanism and efficiency of silicon–phosphorus synergism of flame retardation was studied. The studied systems composed of a phosphorus-containing epoxy resin and various types of silicon additives including nanoscale colloidal silica (CS), tetraethoxysilane (TEOS), and diglycidylether terminated polydimethylsiloxane (PDMS-DG). Thermal stability and degradation kinetics of cured epoxy resins, elemental analysis of degraded residues, and evolved gases analysis of degradation reactions were conducted with a thermogravimetric analyser, energy-dispersive X-ray spectrometry, and gas chromatography–mass spectrometry, respectively. Addition of silicon compounds showed significant effect on enhancing the thermal stability and char yields of the cured epoxy resins. During thermal degradation, TEOS and PDMS-DG exhibited silicon migration to sample surface and CS did not. Self-degradation of PDMS-DG resulted in a silicon loss for PDMS-DG-containing epoxy resin. From the results it was concluded that using TEOS as an additive for epoxy resins and formation of epoxy-silica hybrid structure through sol–gel reactions was a good approach for achieving phosphorus–silicon synergism in flame retardation.