UV and UV/H2O2 Photochemical Degradation of Ciprofloxacin in Aqueous Solution

郭洪光,高乃云,张永吉,隋铭皓
2011-01-01
Abstract:To solve the problem that the slight pollution of antibiotics in aqueous solution was hard to be removed with the traditional technologies,the degradation tests for residual ciprofloxacin(CIP) in aqueous solution were carried out with the UV technology,and the oxidative degradation rate of CIP was studied.The effect of initial concentration of reactant,pH value of reaction solution,adding dosage of hydrogen peroxide as well as different anions and cations on the removal rate of CIP was discussed.The results indicate that with increasing the initial concentration of reactant,the reaction rate of degrading CIP by UV decreases.When the initial concentration of reactant increases from 1 mg/L to 20 mg/L,the degradation rate constant reduces from 0.032 2 min-1 to 0.014 7 min-1.In addition,the neutral pH value is the most suitable condition for gradation.In the UV/H2O2 system,the optimum adding concentration of hydrogen peroxide is 1 mg/L.The anions and cations have different influence on the degradation of CIP by UV.The reaction degradation constant in anion system shows the order of NO-3〉SO2-4〉CO2-3,and that in cation system exhibits the order of Ca2+〉 Mg2+〉 Cu2+,respectively.
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