Self-Movement Inducing On-Demand Pattern of Mesoporous Silica Thin Film with Oriented Mesochannels

Bin Su,Xuemin Lu,Qinghua Lu,Xin Li,Changquan You,Jia
DOI: https://doi.org/10.1021/cm9022985
IF: 10.508
2009-01-01
Chemistry of Materials
Abstract:An on-demand pattern of mesoporous thin film with oriented mesochannels was attractive for the application of mesoporous thin film in wide fields. In this work, we reported the preparation of such a featured mesoporous silica thin film based on self-movement of solution on a laser pattern-irradiated polyimide film. SEM and EDS observation confirmed that the deposition of silica sol precursor showed strict selectivity on such an irradiated polyimide film surface with aid of photomask: aggregation occurred only on the irradiated region and not on the nonirradiation region. TEM and In-plane XRD results proved that mesochannels in the patterned silica thin film oriented along laser induced surface periodic microgrooves (LIPS). The selective pattern of silica sol solution on the laser pattern-irradiated polyimide surface was attributed to the difference in surface energy between irradiated and nonirradiated regions according to the calculating result based on the contacting angle measurement, which leads to self-movement of silica solution from the low surface energy to high surface energy. The alignment of mesochannels in the patterned silica film resulted form the confining effect of surface microgrooves. Such a selectivity deposition provides a powerful tool to control the on-demand pattern of mesoporous silica film with oriented mesochannels. Further experiments proved that the on-demand control of pattern is applicable not only for the pure silica mesoporous system, but also for other hybrid systems based on mesoporous materials.
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