Current Crowding and its Effects on Electromigration and Interfacial Reaction in Lead-Free Solder Joints

Hao Lu,Chun Yu,Peilin Li,Junmei Chen
DOI: https://doi.org/10.1115/1.2957322
2008-01-01
Journal of Electronic Packaging
Abstract:The current density distribution in a line-to-bump structure as a function of cross-sectional area ratio of the electrical conductor was investigated, as well as the effects of current crowding on electromigration and interfacial reaction in lead-free solder joints. Finite element analysis shows that the crowding factor is directly proportional to the cross-sectional area ratio between Cu line and contact opening at the cathode side. Cu/Sn-3.0Ag-0.5Cu/Cu solder joints with Cu line in different widths were designed and tested under 1x10(3) A/cm(2) at 60 degrees C for 430 h. The experiment results show that big voids induced by electromigration are only formed at the structure with a narrower line. Moreover, the growth of intermetallic compound layers, as well as dissolution of Cu at the cathode side, is accelerated by smaller current crowding, whereas impeded by a bigger one.
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