Enhanced emission and surface modification in ZnO treated with Ar, H, and O plasmas
Zilan Wang,Xiaoyu Cao,Haoyang Li,Zhigang Wang,Francis C.C. Ling
DOI: https://doi.org/10.1016/j.physb.2024.416675
IF: 2.988
2024-11-02
Physica B Condensed Matter
Abstract:Plasma treatment is a crucial technique for manipulating the optoelectronic properties of ZnO devices by modifying surface defects. The choice of plasma gas in the treatment process significantly influences these defects, as evidenced by the luminescence characteristics. In this paper, significant differences have been observed in the photoluminescence spectra of ZnO films and single crystals before and after treatment with three kinds of plasma gas. After Ar and H plasma treatment, the UV emission is significantly enhanced up to 1000 times, while the visible emission is suppressed. Conversely, after O plasma treatment, the UV emission remains unchanged, but the deep level emission exhibits a subtle transformation. Since the influence depth of plasma treatment is confined to the surface, all these alterations of typical luminescence are strongly dependent on surface-related defects, thereby challenging the previous interpretation that they originate from bulk defects. The modification effects of various plasmas on surfaces are confirmed from multiple perspectives, and the mechanisms behind the enhancement or suppression of luminescence are systematically analyzed. A comprehensive understanding of plasma treatment, along with precise control of surface defects, is crucial for optimizing the performance of ZnO devices.
physics, condensed matter