Inhibition of Photosystem Ⅱ Enhances the N-mediated Resistance but Attenuates Tobacco Nonhost Resistance.

HE Wei-hua,CAI Xin-zhong,ZHANG Zhi-xin
DOI: https://doi.org/10.3321/j.issn:1008-9209.2006.06.007
2006-01-01
Abstract:Influence of light through photosynthesis-mediated pathway on plant gene-for-gene resistance and nonhost resistance was studied, employing the herbicide diuron as inhibitor of photosystem Ⅱ which is involved in electron transport during photosynthesis,the tobacco F1 progeny carrying the R/Avr complementary gene pair N/P50 as materials of study on plant gene-for-gene resistance,and Colletotrichum adlay isolate and its nonhost tobacco as interaction system of study on plant nonhost resistance.It was found that treatment with 23.3 mg·L~(-1) diuron speeded up the N-mediated hypersensitive response in the N/P50 tobacco.The original tobacco nonpathogen Colletotrichum adlay isolate successfully infected 23.3 mg·L~(-1) diuron-treated tobacco plants,resulting in lesions mimicking typical anthracnose disease symptom.However,expansion of the lesions was limited,and no significant amount of spores formed.Thus,the photosystem Ⅱ-mediated pathway attenuated the N-mediated resistance but enhanced tobacco nonhost resistance to Colletotrichum adlay isolate.These data demonstrate that the photosystem Ⅱ-mediated pathway influences a variety of types of plant disease resistance by a different way.
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