Mutation-Screening in Xylanase-Producing Strains by Ion Implantation
Li Shichang,Wu Min,Yao Jianming,Pan Renrui,Yu Zengliang
DOI: https://doi.org/10.1088/1009-0630/7/1/023
2005-02-01
Plasma Science and Technology
Abstract:With ion implantation (N+, energy 10 keV and dosage 1.56 × 1015 N+ cm-2), a high xylanase-producing strain Aspergillus niger N212 was selected. Based on an orthogonal experiment, an optimal fermentation condition was designed for this high-yield strain. The suitable medium was composed of 8% corncob; 1.0% wheat bran; 0.1% TWEEN20; 0.5% (NH4)2SO4; 0.5% NaNO3; 0.5% FeSO4, 7.5 × 10-4; MnSO4·H2O, 2.5 × 10-4; ZnSO4, 2.0 × 10-4; CoCl2, 3.0 × 10-4. At present, under our experiment condition, xylanase activity of Aspergillus niger N212 reached a level of 600 IU/ml, almost increased by 100% in xylanase production and the time of yielding xylanase was largely reduced to 12 h at 28 °C.
physics, fluids & plasmas