Abstract:Laser-sustained plasmas (LSP), which can be utilized for a novel radiation light source, have advantages such as high irradiance, broad spectral range, and stable emission, demonstrating significant applications for wafer inspection in the field of the semiconductor industry. This paper revisited the historical development of LSP research and introduced fundamental physical processes in LSP. The mathematical description equations for LSP and methods for calculating plasma parameters are given, based on which a time-dependent two-dimensional fluid model is established with laser-thermal-hydrodynamic coupling effects. The propagation of the laser in plasmas is investigated based on the established model, and the fundamental mechanisms in LSP, including the initial evolution process, laser energy deposition, steady-state characteristics, and instability, are explored. The effectiveness of the simulation model is confirmed through comparisons with the results from high-pressure Xe LSP experiments. The findings indicate that the mode, power, F number of incident lasers, as well as parameters including components, pressure, and flow velocity of gas, influence the steady-state properties of LSPs. Under identical power and F number conditions, Gaussian mode and annular mode lasers produce LSP with different shapes and positions. Notably, under conditions of high-power annular laser incidence, large laser F numbers, and high flow velocities, the simulation results reveal temporal and spatial instability in LSP. These simulation results contribute significantly to a deeper understanding of the underlying physical mechanisms of LSP. Furthermore, they provide a theoretical basis for the design of light source systems and the optimization of multiple parameters. The impact of laser parameters on LSP properties elucidated in this study advances not only the fundamental understanding of LSP but also offers crucial insights for the design and optimization of light source systems in various applications, particularly in the field of optical detection for semiconductor wafer inspection.

Influence of Laser Parameters on Plasma Arc Beam Shaping in the Relativistic Laser-plasma System

Interactive Dynamics of Two Copropagating Laser Beams in Underdense Plasmas.

Intense Laser Beam Guiding in Self-Induced Electron Cavitation Channel in Underdense Plasmas

Effects Of Laser And Plasma Parameters On Shock Wave Generation And Acceleration Of Protons

Model Study on Laser Interaction with Near-Critical Density Plasma

Energy Shift Between Two Relativistic Laser Pulses Copropagating in Plasmas

Numerical study on parameters for a longitudinal pulsed discharge Ne-CuBrUV laser

Relativistic Electron Bunches Accelerated by Radially Polarized TW Lasers from Near-Critical-density Plasmas

Ion Motion Effects on the Generation of Short-Cycle Relativistic Laser Pulses During Radiation Pressure Acceleration

Laser Shaping of a Relativistic Intense, Short Gaussian Pulse by a Plasma Lens

Relativistic Electron Heating in Laser-Produced Plasmas

Electron Acceleration in Combined Intense Laser Fields and Self-Consistent Quasistatic Fields in Plasma

Linear Theory Of Multibeam Parametric Instabilities In Homogeneous Plasmas

Simple Plasma Current Model and Its Application in Laser Beam Welding

Multiphysics Modeling and Simulations of Laser-sustained Plasmas

Nonlinear Properties of Relativistically Intense Laser in Plasmas

Particle-in-cell simulations of laser-plasma interactions at solid densities and relativistic intensities: the role of atomic processes

Theoretical Studies on Propagation of Ultraintense Laser Pulses in Preformed Narrow Plasma Channel

Theoretical Investigation on Novel Particle Beams and Radiation Sources in Relativistic Laser-Solid Interactions

Theoretical and Numerical Investigation for Propagation of Ultrashort Intense Laser Pulse in Plasma Channel

Electron Acceleration by the Short Pulse Laser in Inhomogeneous Underdense Plasmas