Effect of Electrodeposition Time on Microstructure, Wettability and Optical Properties of ZnO Nanorod Arrays
Zezhou Gong,Miao Zhang,Guang Yao,Jianguo Lv,Xishun Jiang,Lei Yang,Yunlang Cheng,Jiajia Tao,Xingzhi Wang,Zhuang Wang,Gang He,Zhaoqi Suna
DOI: https://doi.org/10.1149/2.1201610jes
IF: 3.9
2016-01-01
Journal of The Electrochemical Society
Abstract:In this article, we fabricated ZnO nanorod arrays on ITO substrates by cathodic electrodeposition method under different electrodeposition times. The XRD results illustrate that all of the peaks can be attributed to the hexagonal wurtzite structure. Besides, the crystallinity and the preferred c-axis orientation increase with longer electrodeposition time. With the increasing electrodeposition time, the diameter of nanorods, the surface roughness and thickness of ZnO nanorod arrays also increased. All samples exhibit hydrophobic behavior and the water contact angle (CA) increases to 120 degrees with the electrodeposition time increases to 120 min. After 10 min of ultraviolet (UV) irradiation, the wettability of the ZnO surfaces turn from hydrophobic to hydrophilicity, and the change of the CA reduction rate are 73.5, 63.5, 48.3 and 24.2%, corresponding to the sample electrodeposited 10, 30, 60 and 120 min, respectively. The intensity of UV emission peak ratio increases from 2.26 to 63.84% while the visible emission peak ratio decreases in PL spectra, which reveals defects decrease when electrodeposition time increases from 10 to 120 min. Raman spectrum shows three peaks which are located at 439, 566 and 1097 cm(-1), corresponding to the E-2, E-1L and E-3 mode of ZnO. (C) 2016 The Electrochemical Society. All rights reserved.