Abstract:A rapid and cost-effective lithographic method, polymer blend lithography (PBL), is reported to produce patterned self-assembled monolayers (SAM) on solid substrates featuring two or three different chemical functionalities. For the pattern generation we use the phase separation of two immiscible polymers in a blend solution during a spin-coating process. By controlling the spin-coating parameters and conditions, including the ambient atmosphere (humidity), the molar mass of the polystyrene (PS) and poly(methyl methacrylate) (PMMA), and the mass ratio between the two polymers in the blend solution, the formation of a purely lateral morphology (PS islands standing on the substrate while isolated in the PMMA matrix) can be reproducibly induced. Either of the formed phases (PS or PMMA) can be selectively dissolved afterwards, and the remaining phase can be used as a lift-off mask for the formation of a nanopatterned functional silane monolayer. This “monolayer copy” of the polymer phase morphology has a topographic contrast of about 1.3 nm. A demonstration of tuning of the PS island diameter is given by changing the molar mass of PS. Moreover, polymer blend lithography can provide the possibility of fabricating a surface with three different chemical components: This is demonstrated by inducing breath figures (evaporated condensed entity) at higher humidity during the spin-coating process. Here we demonstrate the formation of a lateral pattern consisting of regions covered with 1 H ,1 H ,2 H ,2 H -perfluorodecyltrichlorosilane (FDTS) and (3-aminopropyl)triethoxysilane (APTES), and at the same time featuring regions of bare SiO x . The patterning process could be applied even on meter-sized substrates with various functional SAM molecules, making this process suitable for the rapid preparation of quasi two-dimensional nanopatterned functional substrates, e.g., for the template-controlled growth of ZnO nanostructures Bauermann, L. P.; Gerstel, P.; Bill, J.; Walheim, S.; Huang, C.; Pfeifer, J.; Schimmel, T. Langmuir 2010, 26, 3774–3778. doi:10.1021/la903636k.

SUBSTRATE-INDUCED POLYMER BLEND PHASE SEPARATION FOR PREPARING HIGHLY UNIFORM PATTERNS

Self-Assembly of Polymer Thin Film on Chemically Patterned Substrate

Surface-induced Phase Separation of Binary Polymer Blends on the Chemically Patterned Substrate

Phase Separation Induced Ordered Patterns in Thin Polymer Blend Films

Phase separation of polymer-dispersed liquid crystals on a chemically patterned substrate.

Patterning Thin Polymer Films by Surface-Directed Dewetting and Pattern Transfer

Phase Separation and Dewetting Induced Surface Pattern in PS/PMMA Blend Films

Facile fabrication of patterned polymeric films via phase separation-induced surface segregation

Phase Dynamics and Wetting Layer Formation Mechanisms of Pattern-Directed Phase Separation in Binary Polymer Mixture Films with Asymmetry Compositions

Phase Separation Of Silicon-Containing Polymer/Polystyrene Blends In Spin-Coated Films

Influence of Substrate Confinement on the Phase-Correlation in the Capillary Breakup of Arrays of Patterned Polymer Stripes.

Topographically Uniform but Chemically Heterogeneous Nanostructures by Nanoimprinting Demixed Polymer Blends

Polymer blend lithography: A versatile method to fabricate nanopatterned self-assembled monolayers

Influence of Weight Ratio in Polymer Blend Film on the Phase Separation Structure and Its Optical Properties

Pattern Formation by Dewetting of Polymer Thin Film

Kinetic Pathway of Pattern-Directed Phase Separation in Binary Polymer Mixture Films

Vertical phase separation and liquid-liquid dewetting of thin PS/PCL blend films during spin coating.

Patterning Flat-Sheet Poly(vinylidene Fluoride) Membrane Using Templated Thermally Induced Phase Separation

Microphase Separation of Block Copolymer Thin Films.

A New Strategy of Lithography Based on Phase Separation of Polymer Blends

Digitally Programmable Microphase Separation in Polymer Network Generates Microstructure Pattern