Photolysis of Glyoxal at 193, 248, 308 and 351 Nm

L Zhu,D Kellis,CF Ding
DOI: https://doi.org/10.1016/0009-2614(96)00570-2
1997-01-01
Abstract:The UV photochemistry of glyoxal in nitrogen has been investigated by employing excimer laser photolysis at 193, 248, 308 and 351 nm in combination with cavity ring-down spectroscopy. The HCO radical was a photofragmentation product with yields of 0.42 ± 0.21, 0.53 ± 0.24, 0.69 ± 0.29, and 1.5 ± 0.6 at 193, 248, 308 and 351 nm. The larger than unity HCO yield at 351 nm suggests the photolysis channel (CHO)2 + hv (351 nm) → 2 HCO. The decrease in HCO yields at higher photolysis photon energies is attributed to the opening up of additional glyoxal photolysis pathways.
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