Running Shanghai Soft x-ray FEL with the EEHG scheme

D Xiang,G. Stupakov

DOI: https://doi.org/10.2172/944555

2008-01-01

Abstract:With the nominal beam parameters (beam energy: 0.84 GeV, slice energy spread: 168 keV, peak current: 600 A, normalized emittance: 2 mm mrad) of the Shanghai soft X-ray Free Electron Laser (SXFEL) project, we show that using the echo-enabled harmonic generation (EEHG) scheme, 9 nm coherent soft x-ray with peak power exceeding 400 MW can be generated directly from the 270 nm seeding laser. dispersion section is chosen to be strong enough, so that the energy and the density modulations induced in the first modulator is macroscopically smeared due to the slippage effect. At the same time, this smearing introduces a complicated fine structure into the phase space of the beam. The echo then occurs as a recoherence effect caused by the mixing of the correlations between the modulation in the second modulator and the structures imprinted onto the phase space by the combined effect of the first modulator and the first dispersion section. The key advantage of the echo scheme is that the amplitude of high harmonics of the echo is a very slow function of the integer numbers n and m, which is in sharp contrast to the classic HGHG scheme (3) where the amplitude of the high harmonics exponentially decays as the harmonic number increases. Due to the relatively low up-frequency conversion efficiency, in order to generate coherent soft x-rays using an UV wavelength seeding laser, multiple stages of the classic HGHG scheme are to be used (4). The EEHG, however, allows for generation of coherent soft x-ray directly from the UV seed laser, taking advantage of its high up-frequency conversion efficiency. We show in this paper that the SXFEL project can benefit from the EEHG scheme: the 9 nm soft x-rays with peak power exceeding 400 MW can be generated directly from the 270 nm seeding laser in a single-stage.