Abstract:Undoped micrometer (μm)‐thick zinc oxide (ZnO) films with intense ultraviolet (UV) luminescence, ultrafast picosecond decay times, and suppressed defect‐related visible luminescence owing to better crystallinity, fewer defects, and decreased oxygen vacancies are deposited on bufferless soda lime glass substrates using a hybrid plasma deposition technique combining pulsed reactive magnetron sputtering operating in the medium‐frequency range (MF magnetron) with an electron cyclotron wave resonance (ECWR) plasma. Ultrafast sub‐100 picosecond luminescence is vital in many applications involving ultrafast events and time‐of‐flight systems. Materials exhibiting fast luminescence, such as barium fluoride (BaF2) and zinc oxide (ZnO), also suffer from an intrinsically slow nanosecond (ns) to microsecond (μs) luminescence. Here, 2.2 micrometer (μm)‐ to 5.7 μm‐thick undoped ZnO films on soda‐lime glass (SLG) substrates without a buffer layer by a hybrid pulsed reactive magnetron sputtering operating in the medium‐frequency range (MF magnetron) assisted by an electron cyclotron wave resonance (ECWR) plasma is deposited. The undoped ZnO films exhibited superior optical properties characterized by intense ultraviolet (UV) luminescence, unprecedented ultrafast decay times, and for the case of MF+ECWR‐deposited films, suppressed defect‐related visible luminescence. The 2.2 μm‐thick MF‐deposited film exhibited the fastest 9‐ps decay time at room temperature. The impressive properties of the films are attributed to the use of advanced deposition technology with properly tuned plasma parameters, especially a high degree of dissociation of molecular oxygen together with an increased proportion of activated zinc particles, leading to a higher deposition rate, better crystallinity, fewer defects, and a lower proportion of oxygen vacancies. These films will pave the way toward the development of time‐of‐flight detectors, high‐resolution nuclear imaging cameras, and high‐rate ultrafast timing devices.

Electrostatic Spray Deposited Polycrystalline Zinc Oxide Films for Ultraviolet Luminescence Device Applications

The growth of nanoscale ZnO films by pulsed-spray evaporation chemical vapor deposition and their structural, electric and optical properties

Effect of Solution Concentrations on Crystal Structure, Surface Topographies and Photoluminescence Properties of ZnO Thin Films

Surface Morphology, Electrochemical and Electrical Performances of ZnO Thin Films Sensitized with Ag Nanoparticles by UV Irradiation

Enhanced Visible Light Response of ZnO Porous Thin Film by Post-Annealing Treatment

Photoluminescence and ultraviolet lasing of polycrystalline ZnO thin films prepared by the oxidation of the metallic Zn

Preparation and Photoluminescence of ZnO with Nanostructure by Hollow-Cathode Discharge

Preparation and Optical Properties of ZnO Films by Cathodic Electrodeposition

Thermal-desorption Induced Enhancement and Patterning of Ultraviolet Emission in Chemically Grown ZnO

Ultraviolet Emission Properties of ZnO Film with Zinc Deficiency by SS CVD

Strong Ultraviolet Emission and Rectifying Behavior of Nanocrystalline ZnO Films

Influences of Substrate and Annealing on the Structural and Optical Properties and Photoluminescence of Nanocrystalline Zno Films Prepared by Plasma Assisted Pulsed Laser Deposition

Electrodeposition and Characterization of ZnO Thin Films

Electrochemical Deposition and Stimulated Emission of Zinc Oxide Thin Films

Ultraviolet Emission in ZnO Films Controlled by Point Defects

Synthesis and luminescence properties of electrodeposited ZnO films

Photoluminescence and Optically Pumped Ultraviolet Lasing from Nanocrystalline ZnO Thin Films Prepared by Thermal Oxidation of High-Quality ZnS Thin Films

Low Temperature Cathodic Electrodeposition of Nanocrystalline Zinc Oxide Thin Films

Optical properties of ultrathin ZnO films fabricated by atomic layer deposition

Deep ultraviolet emission of ZnO films prepared by RF magnetron sputtering at changing substrate temperature

Ultrafast UV Luminescence of ZnO Films: Sub‐30 ps Decay Time with Suppressed Visible Component