Investigating carbon materials for use as the electron emission source in a parallel electron-beam lithography system

W.I Milne,K.B.K Teo,M Chhowalla,G.A.J Amaratunga,J Yuan,J Robertson,P Legagneux,G Pirio,Karim Bouzehouane,D Pribat,W Bruenger,C Trautmann

DOI: https://doi.org/10.1016/S1567-1739(01)00030-X

IF: 2.856

2001-01-01

Current Applied Physics

Abstract:A microelectronic parallel electron-beam lithography system using an array of field emitting microguns is currently being developed. This paper investigates the suitability of various carbon based materials for the electron source in this device, namely tetrahedrally bonded amorphous carbon (ta-C), nanoclustered carbon and carbon nanotubes.