Self‐Organization via Dewetting in Polymeric Assemblies
Kibeom Nam,Dong Yun Lee
DOI: https://doi.org/10.1002/smll.202400255
IF: 13.3
2024-04-12
Small
Abstract:This study introduces a novel approach for spontaneous patterning of polymeric assemblies using dewetting phenomenon. Through controlled evaporative self‐assembly, patterns such as dots and lines are formed on substrates with polymers and nanoparticles. This process modifies surface geometry and achieves heterogeneous surfaces, signifying significant progress in materials science with broad industrial applications. Dewetting is a spontaneous process involving a thin liquid film that minimizes interfacial energy by reducing the surface area via the generation of defects on the film. In industry, dewetting is regarded as a problem that results in defects or a heterogeneous surface; however, in this study, dewetting is intentionally induced to create various patterns at intended positions spontaneously with polymeric materials and nanoparticles. The dewetting‐induced patterning process is conducted by controlling the capillary force and evaporation ratio through an evaporative self‐assembly system. The linear‐polymeric arrays on the substrate played an important role in modifying the surface geometry and treatment for a heterogeneous surface, and an additional patterning process is performed on patterned arrays to create dewetting‐induced self‐organizing patterns. Here, this method is used to introduce material arrays with specific shapes such as dots, dumbbells, potbellies, Vs, and trapezoids.
materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter,nanoscience & nanotechnology