Patterned intermetallic reaction of Ni3Al by laser interference structuring

Zhongfan Liu,X.K. Meng,T. Recktenwald,F. Mücklich
DOI: https://doi.org/10.1016/S0921-5093(02)00247-2
2003-01-01
Abstract:Laser interference patterns were used to structure Ni–Al thin films on silicon. Hard and soft properties were combined in the patterned surface in the form of dot- or line-array through local intermetallic reactions. WLI and AFM showed the topography of the structured sample; X-ray diffraction (XRD) and nano-indentation showed the intermetallic phase and its microhardness.
What problem does this paper attempt to address?