Galvanic Deposition of Nanostructured Noble-Metal Films on Silicon

YY Song,ZD Gao,JJ Kelly,XH Xia
DOI: https://doi.org/10.1149/1.2033616
2005-01-01
Electrochemical and Solid-State Letters
Abstract:Large-area nanostructured noble-metal films (Ag, Pt, and Au) can be deposited with high yields and various morphologies on silicon formed between the semiconductor and the noble metal by means of a galvanic cell. It is shown that the morphology of Ag, which is different from that of Pt and Au, can be influenced markedly by the deposition conditions. Distinctive surface-enhanced Raman-scattering features are observed on these Ag films. (c) 2005 The Electrochemical Society.
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