Comupter Modling of Low Pressure Chemical-Vapor-Deposition

XU Da-wei,LI Wei-hua,ZHOU Zai-fa
DOI: https://doi.org/10.3969/j.issn.1005-9490.2006.01.068
2006-01-01
Abstract:A two precursor model was discussed.Depending on the discussion of transmission mechanism under low pressure and the reaction result of deposition a LPCVD(low pressure chemical-vapor-deposition)model was got. This model is two dimensions. In order to have a better result, we consider intermediate products in this model which change Sc to the value of R_ uni/R_d. It is programmed by C++ and the string-algorithm ,so it is easy to calculate. By using software we get a result very close to the experiment result.
What problem does this paper attempt to address?