Using Soft Lithography to Fabricate GaAs/AlGaAs Heterostructure Field Effect Transistors

JM Hu,RG Beck,T Deng,RM Westervelt,KD Maranowski,AC Gossard,GM Whitesides

DOI: https://doi.org/10.1063/1.119774

IF: 4

1997-01-01

Applied Physics Letters

Abstract:This letter describes the fabrication of functional GaAs/AlGaAs field effect transistors using micromolding in capillaries—a representative soft lithographic technique. The fabrication process involved three soft lithographic steps and two registration steps. Room temperature characteristics of these transistors resemble those of field effect transistors fabricated by photolithography. The fabrication of functional microelectronic devices using multilayer soft lithography establishes the compatibility of these techniques with the processing methods used in device fabrication, and opens the door for their development as a technique in this area.