STUDY ON LIGHT FASTNESS OF RELIC PROTECTION MATERIAL OF MODIFIED ACRYLIC RESIN

Wang Liqin,Yang Lu,Liang Guozheng
DOI: https://doi.org/10.3969/j.issn.1001-3539.2006.09.018
2006-01-01
Abstract:The relic protection material B72 was developed by modifying acrylic resin with benzotriazole UV absorber.The results of FTIR, reflection spectrum and weight loss tests showed that the light fastness of the material was excellent. This polymer showed extensive application future of effectively protecting base materials and color cultural heritages, without changing their original appearances.
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