Line Defects Embedded in Three‐Dimensional Photonic Crystals

QF Yan,ZC Zhou,XS Zhao,SJ Chua
DOI: https://doi.org/10.1002/adma.200500047
IF: 29.4
2005-01-01
Advanced Materials
Abstract:Conventional optical photolithography is used to create photoresist patterns on a preformed silica colloidal crystal film. Upon regrowth of the same silica colloidal crystal followed by removal of the photoresist patterns, air–core line defects are successfully introduced into the self-assembled silica colloidal crystal (see Figure and inside cover).
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