Abstract:Parylene has attracted significant research attention due to its attractive properties such as good mechanical performance, chemical inertness, and biocompatibility. The development of new methods for patterning the surface of parylene films is likely to lead to attractive new applications not only in the laboratory, but also for industrial products. In this work we present a universal single-step technique to replicate parylene-C films with micro/nano hierarchical structures from a silicon mold. By utilizing an improved deep reactive ion etching (DRIE) process, an ultra-low-surface-energy silicon mold is fabricated first. The parylene-C film is then peeled off from this reusable mold to replicate the micro/nano hierarchical structures directly. By this method, complex multi-scale patterns even on the inclined surfaces, including periodic microstructures and high-density nanostructures can be replicated on the parylene-C film. The parylene-C films presented in this work show enhanced hydrophobicity resulting from the combination of microstructures and nanostructures, achieving a maximum contact angle of 135 degrees. Furthermore, parylene-C films with micro/nano hierarchical structures can be functionalized by design: for example, films with groove-shaped patterns show anisotropic wettability, which is very useful for directional droplet transportation. Additionally, the fabricated samples show remarkable surface-enhanced Raman scattering (SERS) properties, with a maximum enhancement factor of 2.3 x 10(4). This single-step fabrication process is low-cost, high yield, and suitable for mass production, and the parylene-C SERS material with enhanced hydrophobicity shows attractive potential for applications in areas such as microfluidics and biomedical microsystems. (C) 2015 Elsevier B.V. All rights reserved.

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