An In-situ High Temperature XRD Study on Natural Sphalerite

吴婧,李艳,秦善,鲁安怀
DOI: https://doi.org/10.16461/j.cnki.1000-4734.2011.04.017
2011-01-01
Abstract:In-situ high temperature X-ray diffraction study was carried out on the natural sphalerite.The results showed that sphalerite expanded with the increasing temperature and its volume thermal expansion coefficient was 25.61×10-6 ℃-1 in the range of 27-675 ℃.During the heating,an intermediate phase Zn3O(SO4)2 was observed at 543℃,then decomposed into zincite ZnO.The complete breakdown of Zn3O(SO4)2 happened at 797 ℃,accompanied by the formation of ZnFe2O4 which had a spinel structure.At 1160 ℃,ZnO coexisted with ZnFe2O4.The experiment revealed that heat treatment of natural sphalerite could lead to the formation of a certain proportion zincite(ZnO),which could compose a binary compound semiconductor together with sphalerite.When the compound semiconductor system was excited by certain light source,the photo-induced carrier would transfer from one semiconductor particle to the other,reducing the combination of photo-induced electron-hole pairs,which could improve the photocatalytic activity of the system.This work could be theoretically helpful in the field of enhancing the photocatalytic abilities of natural sphalerite using heat treatment.
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