H2S Adsorption on Polycrystalline UO2

QF Wu,BV Yakshinskiy,T Gouder,TE Madey
DOI: https://doi.org/10.1016/s0920-5861(03)00395-x
IF: 5.3
2003-01-01
Catalysis Today
Abstract:We report results on the adsorption and desorption of H2S on polycrystalline UO2 at 100 and 300K, using ultrahigh vacuum X-ray photoelectron spectroscopy (XPS), low energy ion scattering (LEIS), and temperature programmed desorption (TPD). Our work is motivated by the potential for using the large stockpiles of depleted uranium in industrial applications, e.g., in catalytic processes, such as hydrodesulfurization (HDS) of petroleum. H2S is found to adsorb molecularly at 100K on the polycrystalline surface, and desorption of molecular H2S occurs at a peak temperature of ∼140K in TPD. Adsorption rates of sulfur as a function of H2S exposure are measured using XPS at 100K; the S 2p intensity and lineshapes demonstrate that the saturation coverage of S-containing species is ∼1 monolayer (ML) at 100K, and is ∼0.3–0.4ML of dissociation fragments at 300K. LEIS measurements of adsorption rates agree with XPS measurements. Atomic S is found to be stable to >500K on the oxide surface, and desorbs at ∼580K. Evidence for a recombination reaction of dissociative S species is also observed. We suggest that O-vacancies, defects, and surface termination atoms in the oxide surface are of importance in the adsorption and decomposition of S-containing molecules.
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