Research Progress of the Process Technology for Graphene Micro/Nano Structures

Li Yan,Zhang Fang,Chen Hui,Liu Zhibo,Dai Kejie
DOI: https://doi.org/10.3969/j.issn.1671-4776.2013.04.011
2013-01-01
Abstract:The unique optoelectronic properties of the graphene are introduced briefly,which illustrate that the micro/nano processing is the effective method to realize the graphene applied to the electronic and optoelectronic devices.Then,the main techniques of the graphene micro/nano processing are elaborated,including the mask lithography,transfer printing,laser direct writing and interference.The key steps and characteristics of each process technology are explained by examples,and the advantages and disadvantages of different techniques are analyzed.The process flows of the transfer printing-assisted lithography and femtosecond laser direct writing-assisted transfer printing are introduced in detail,the advantages of combining two different techniques applied to the graphene micro/nano structure processing are expounded.Finally,the future development trend of the graphene micro/nano processing is prospected,the problems which have to be further studied are pointed out,and some suggestions on how to obtain the better graphene-based micro/nano structures are presented.
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