Combinatory feed-forward/feedback run torun control of mixed products

Zheng Ying,Ai Bing,Zhang Jie,Wang Yanwei
DOI: https://doi.org/10.3321/j.issn:1671-4512.2009.06.022
2009-01-01
Abstract:A novel control approach which deals with two product process in semiconductor manufacturing industry is presented.It eatimates the patterned tool drift by the data acquired in the previous run.The patterned tool disturbance is obtained by combination of feed-forward and the feedback control for the consecutive runs.The output and AMSE(asymptotic mean square error) are given.And it is proved that its AMSE is irrelated with the interval of the different products.The simulation results show that this approach is valid.
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