Abstract:A dual nanopatterning process of block copolymer self‐assembly and transfer‐printing can create periodic sub‐20 nm structures on an eight‐inch wafer scale by the printing of patterned ultrathin block copolymer film onto desired substrates. Various complex geometries of nano‐in‐micro structures, specifically angular/wave lines, rings, and dot‐in‐hole/dot‐in‐honeycomb patterns consisting of sub‐20 nm SiOx structures are successfully generated by the combined patterning method. Nanotransfer printing (nTP) is one of the most promising nanopatterning methods given that it can be used to produce nano‐to‐micro patterns effectively with functionalities for electronic device applications. However, the nTP process is hindered by several critical obstacles, such as sub‐20 nm mold technology, reliable large‐area replication, and uniform transfer‐printing of functional materials. Here, for the first time, a dual nanopatterning process is demonstrated that creates periodic sub‐20 nm structures on the eight‐inch wafer by the transfer‐printing of patterned ultra‐thin (<50 nm) block copolymer (BCP) film onto desired substrates. This study shows how to transfer self‐assembled BCP patterns from the Si mold onto rigid and/or flexible substrates through a nanopatterning method of thermally assisted nTP (T‐nTP) and directed self‐assembly (DSA) of Si‐containing BCPs. In particular, the successful microscale patternization of well‐ordered sub‐20 nm SiOx patterns is systematically presented by controlling the self‐assembly conditions of BCP and printing temperature. In addition, various complex pattern geometries of nano‐in‐micro structures are displayed over a large patterning area by T‐nTP, such as angular line, wave line, ring, dot‐in‐hole, and dot‐in‐honeycomb structures. This advanced BCP‐replicated nanopatterning technology is expected to be widely applicable to nanofabrication of nano‐to‐micro electronic devices with complex circuits.

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Constructing a Comprehensive Nanopattern Library through Morphological Transitions of Block Copolymer Surface Micelles via Direct Solvent Immersion

Engineering Hybrid Metallic Nanostructures Using a Single Domain of Block Copolymer Templates.

Nanopatterning: A 3D Self‐Shaping Strategy for Nanoresolution Multicomponent Architectures (adv. Mater. 3/2018)

Particle Lithography-Based Patterning of Polyelectrolyte Template Films and Their Application in Fabrication of Gold/silver Nanoparticle Assembly.

New Colloidal Lithographic Nanopatterns Fabricated by Combining Pre-Heating and Reactive Ion Etching

High-resolution combinatorial patterning of functional nanoparticles

Sustainable Fabrication and Transfer of High‐Precision Nanoparticle Arrays Using Recyclable Chemical Pattern Templates

Stepwise Molding, Etching, and Imprinting to Form Libraries of Nanopatterned Substrates.

Fabrication of Integrated Patterns Using Lithography and Particles Assembling Techniques

Tailoring Two-Dimensional Nanoparticle Arrays into Various Patterns

Nonlithographic Fabrication of Nanostructured Micropatterns Via Breath Figures and Solution Growth

2D Ordered Arrays of Nanopatterns Fabricated by Using Colloidal Crystals As Templates

Nanostructuring polymeric materials by templating strategies.

Photolithographic Approaches for Fabricating Highly Ordered Nanopatterned Arrays

Direct Printing of Ultrathin Block Copolymer Film with Nano‐in‐Micro Pattern Structures

A 3D Self-Shaping Strategy for Nanoresolution Multicomponent Architectures

Bioinspired Transfer Method for the Patterning of Multiple Nanomaterials.

Ultrafast Fabrication of Large‐Area Colloidal Crystal Micropatterns Via Self‐Assembly and Transfer Printing

Templated Fabrication of Periodic Arrays of Metallic and Silicon Nanorings with Complex Nanostructures