Abstract:Monolayer transition metal oxides have emerged as an exciting area of study of two-dimensional materials. It is crucial to comprehend the structural stability and physical characteristics of various dielectric materials at the ultrathin level due to the diminishing size of microelectronic equipment. In this regard, we have studied the structural, optoelectronic and thermodynamical characteristics of the 1T phase of transition metal oxides TMO 2 (TM = Zr and Hf) using first-principles computations. The structural stability of both monolayers has been assessed by formation enthalpy computations, which suggest that both monolayers are thermodynamically stable and can be synthesized experimentally. The optimized lattice parameters for 1T-ZrO 2 and 1T-HfO 2 are found to be 3.15 and 3.17 Å, respectively. The phonon calculations assure the dynamical stability of both monolayers as there are no imaginary frequencies present in the phonon dispersion plots. In order to assess the thermodynamical stabilities of TMO 2 monolayers, various thermodynamical characteristics have been determined for 0 to 1000 K. Notably, the TMO 2 monolayers depict their thermal stability as both monolayers possess negative free energies up to 1000 K. The maximum calculated formation enthalpy value for 1T-ZrO 2 and 1T-HfO 2 is − 0.86 and − 0.85 eV, respectively, at 1000 K. Furthermore, the 1T-ZrO 2 show the high thermal stability than 1T-HfO 2 because it has a lower Helmholtz free energy value. Electronic properties have been analyzed through density of states and band structures calculations. The calculated band gaps for 1T-ZrO 2 and 1T-HfO 2 monolayer are 4.30 and 5.41 eV, respectively. The difference in the band gaps develops due to the varying energy levels by the valence orbitals of Zr (5s 2 , 4d 2 ) and Hf (6s 2 , 5d 2 ). The indicated difference acts as the main distinguishing feature among the studied metal oxides. Moreover, the valence bands in both metal oxide monolayers are mostly obtained from the p-states of Oxygen, and d-states of Zr and Hf. Furthermore, numerous optical characteristics for both under-study monolayers have been computed and compared. The first critical edge for 1T-ZrO 2 and 1T-HfO 2 are found to be 2.13 and 1.95, respectively. The highest absorption peaks for 1T-ZrO 2 and 1T-HfO 2 are noted at 5.43 and 6.24 eV. It is found that the absorptivity of 1T-HfO 2 is 2.91% higher as compared to 1T-ZrO 2 . The high value of dielectric constants, efficient thermodynamical stability and wide band gaps of under-investigation TMO 2 (TM = Zr and Hf) make them the potential contenders for 2D FETs. In short, our findings suggested that monolayers TMO 2 are ideal choices for a range of applications and could help in developing efficient optoelectronic devices.

Electronic Structure Differences in Zro2 Vs Hfo2

Insights into the atomic structure of the interface of ferroelectric Hf 0.5 Zr 0.5 O 2 grown epitaxially on La 2 / 3 Sr 1 / 3 Mn O 3

Experimental investigation of dipole formation and modulation at Hf 0.5 Zr 0.5 O 2 /SiO 2 interface

Low-temperature Polymorphs of ZrO2 and HfO2. A Density Functional Theory Study

Electronic and Atomic Structure of Metal-Hfo2 Interfaces

Structural and dielectric properties of amorphous ZrO2 and HfO2

Combined computational and experimental investigation of high temperature thermodynamics and structure of cubic ZrO2 and HfO2

Structural and electronic properties of cubic HfO2 surfaces

The Structure of Cubic MOF [{ca(h2o)6}{cagd(oxydiacetate)3}2].4h2o. A Comparison Between Structural Models Obtained from Rietveld Refinement of Conventional and Synchrotron X-ray Powder Diffraction Data and Standard Refinement of Single-Crystal X-ray Diffraction Data

First-principles Study of Electronic and Dielectric Properties of ZrO2 and HfO2

Electron Crystallography Reveals Atomic Structures of Metal-Organic Nanoplates with M12(μ3-O)8(μ3-OH)8(μ2-OH)6 (M = Zr, Hf) Secondary Building Units.

Density Functional Calculations on Atomic and Electronic Structures of Amorphous Hfo2/Si(001) Interface

Structural Stability and Polarization Analysis of Rhombohedral Phases of HfO2

Exploring optoelectronic and thermal properties of HfS 2 /ZrS 2 heterojunction under mechanical strain, atomic doping and external electric field

Structural, Optoelectronic and Thermodynamical Properties of 1T Phase of Transition Metal Oxides TMO2 (TM = Zr and Hf): A first-principles Study

Composition-dependent structure and bandgaps in Hf x Zr1− x O2 thin films

The structural stability and polarization analysis of rhombohedral phase HfO2

First-principles study of structural, vibrational, and lattice dielectric properties of hafnium oxide

Structural and dielectric properties of crystalline and amorphous ZrO2

Structure and optical properties of Zr<sub>x</sub>Hf<sub>1-x</sub>O<sub>2</sub> films deposited by pulsed laser co-ablation of Zr and Hf targets with the assistance of oxygen plasma

First-principles study of structural, vibrational and lattice dielectric properties of hafnium oxide