Abstract:There are two adsorption modes for oxygen on silver: atomic and molecular. The results of ultra-high-vacuum temperature-programmed desorption of oxygen show that three states of oxygen are present on the Ag/SiO2 surface. They are surface molecular oxygen ( T-p = 340 K), bulk-dissolved atomic oxygen ( T-p = 570 K) and sub-surface atomic oxygen ( T-p = 700 similar to 800 K). No surface atomic oxygen species is detected, owing to the decrease of the concentration of the surface atomic oxygen during the high-temperature treatment in the preparation process of Ag/SiO2. The high-temperature treatment also increases the defect concentration on the silver surface, which favors the diffusion of surface atomic oxygen to the bulk and to form bulk-dissolved oxygen. The surface molecular oxygen desorbs at 340 K and does not react with CO. Increasing the partial pressure of gas-phase oxygen can facilitate the diffusion of oxygen to the bulk, resulting in an increase in the intensity of the desorption peak of the bulk dissolved-oxygen. The desorption temperature of the sub-surface oxygen is higher than those of the other two oxygen species because of the high resistance for the diffusion of oxygen from the bulk to the surface. Both the bulk-dissolved and the sub-surface oxygen desorption peaks are formed via the diffusion of bulk-dissolved oxygen to the surface but follow different diffusion mechanisms. The bulk-dissolved oxygen diffuses via an interstitial mechanism at low temperature since the active energy is low, while the sub-surface oxygen must get over much higher active energy to perform interstitialcy diffusion at high temperature.

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