Abstract:Nominally identical permalloy nanowires, with widths down to 150 nm, were fabricated onto a single electron transparent Si$_{3}$N$_{4}$ membrane using electron beam lithography (EBL) and focused ion beam (FIB) milling. Transmission electron microscopy (TEM) experiments were performed to compare the nanostructures produced by these two techniques in what we believe is the first direct comparison of fabrication techniques for nominally identical nanowires. Both EBL and FIB methods produced high quality structures with edge roughness being of the order of the mean grain size 5 -10 nm observed in the continuous films. However, significant grain growth was observed along the edges of the FIB patterned nanowires. Lorentz TEM \emph{in situ} imaging was carried out to compare the magnetic behavior of the domain walls in the patterned nanowires with anti-notches present to pin domain walls. The overall process of domain wall pinning and depinning at the anti-notches showed consistent behaviour between nanowires fabricated by the two methods with the FIB structures having slightly lower characteristic fields compared to the EBL wires. However, a significant difference was observed in the formation of a vortex structure inside the anti-notches of the EBL nanowires after depinning of the domain walls. No vortex structure was seen inside the anti-notches of the FIB patterned nanowires. Results from micromagnetic simulations suggest that the vortex structure inside the anti-notch can be suppressed if the saturation magnetization (M$_{s}$) is reduced along the nanowires edges. Whilst the two fabrication methods show that well defined structures can be produced for the dimensions considered here, the differences in the magnetic behavior for nominally identical structures may be an issue if such structures are to be used as conduits for domain walls in potential memory and logic applications.

In Situ Investigation of the Magnetic Domain Wall in Permalloy Thin Film by Lorentz Electron Microscopy

In Situ Lorentz Microscopy Observation of Displaced Chain Walls in Permalloy

In situ Lorentz electron microscopy observation of displaced Chain walls in permalloy using a homemade magnetizing stage

Characterization of Magnetic Domain Walls Using Electron Magnetic Chiral Dichroism

Measurement of the Remnant Magnetic-Field in Lorentz Mode Using Permalloy

Magnetic Domain Wall Engineering in a Nanoscale Permalloy Junction

Magnetic domain wall dynamics studied by in-situ Lorentz microscopy with aid of custom-made Hall-effect sensor holder

Lorentz TEM imaging of stripe structures embedded in a soft magnetic matrix

Magnetization Reversal and Configurational Anisotropy of Dense Permalloy Dot Arrays

Direct comparison of domain wall behavior in Permalloy nanowires patterned by electron beam lithography and focused ion beam milling

Direct visualization of local magnetic domain dynamics in a 2D Van der Walls material/ferromagnet interface

Ptychographic Imaging of Magnetic Domain Wall Dynamics

Local Control of Magnetic Anisotropy in Transcritical Permalloy Thin Films Using Ferroelectric BaTiO3 Domains

Direct observation of magnetic domain walls in glass-coated submicronic amorphous wires

Depinning of Domain Walls in Permalloy Nanowires with Asymmetric Notches

Observation of Azimuthal Ferromagnetic Resonance Modes in 1.0μm Diameter Permalloy Rings

Spin-Orbit-Coupling-Induced Domain-Wall Resistance in Diffusive Ferromagnets

Dzyaloshinskii-Moriya-Interaction-Like Behavior in Confined Permalloy Nanostructures Via Coupled Magnetic Vortices

Geometry-induced Bloch point domain wall in Permalloy conical frustum nanowires for advanced spintronics applications

Magnetic Microscopy and Imaging

Magnetic Force Microscopy Study of Electron-Beam-patterned Soft Permalloy Particles: Technique and Magnetization Behavior