Photopatternable Imaging Layers for Controlling Block Copolymer Microdomain Orientation

Eungnak Han,Insik In,Sang-Min Park,Young-Hye La,Yao Wang,Paul F. Nealey,Padma Gopalan
DOI: https://doi.org/10.1002/adma.200602708
IF: 29.4
2007-01-01
Advanced Materials
Abstract:An ultrathin photo-crosslinkable random copolymer film was designed as a substrate-independent imaging layer for block copolymer (BCP) thin films. Negative-tone resist chemistry was combined with the chemistry of neutral surfaces to formulate the imaging layer. The synthesis of the imaging layer, optimization of the photo-crosslinking conditions, and patterning of BCP thin films on the imaging layer is discussed. The mild room temperature crosslinking chemistry is especially attractive for BCPs containing temperature-sensitive monomers.
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