Bioeffects of Low Energy Ion-Beam Implantation and Vacuum Treatment on M$_1$ Arabidopsis Thaliana

Gen Yang,Po Bian,Zhenghong Zhang,Jie Ren,Lijun Wu,Zengliang Yu
DOI: https://doi.org/10.1088/1009-0630/8/2/25
2006-01-01
Abstract:Vacuum treatment and ion-beam bombardment are two major processes in the low energy ion-beam implantation. To accurately study the contributions of these two major factors to the bioeffects separately, the M1 generation variation of Arabidopsis thaliana with ion-beam implantation and vacuum treatment were compared through a series of key plant development parameters including morphological observation, biochemical assay and RAPD (random amplified polymorphic DNA) analysis. The results showed that ion-beam implantation had obvious effect on almost all of these parameters, and the vacuum treatment had some impacts on several morphological parameters such as the bolting time and the length of the primary stem. Taking the results together, the indication is that vacuum treatment has some slight contributions to the bioeffects of ion-beam implantation while ion-beam bombardment itself is the major creator of the bioeffects.
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