Abstract:In electron microscopy high-resolution imaging of finest object structures is generally hampered by the influence of aberrations of the lens system, especially the high spherical aberration of the objective lens. The delocalization of contrast details induced by aberrations is especially strong for microscopes equipped with a field emission gun providing a high spatial coherence. in recent years a prototype of an aberration correction system has been constructed by Haider et al., following a suggestion by Rose, consisting of two hexapole elements and four additional round lenses. The correction system was adapted to a Philips CM 200 FEG ST microscope with an information limit of 0.13 nm. The alignment is carried out using aberration measurements deduced from Zemlin tableaus. By appropriately exciting the hexapole elements it is possible to reduce or even fully compensate the spherical aberration of the objective lens. With the freedom of a variable spherical aberration C s new operation modes can be accessed that are not available in standard microscopes. with C s = 0 and defocus Z = 0 pure amplitude contrast occurs, together with a vanishing contrast delocalization; phase contrast with a single, narrow pass-band up to the information limit can still be achieved by Z = ±7 nm, which introduces a delocalization of R = 0.13 nm. with Cs = 97 μm and Z = −18 nm the broad Scherzer pass-band for phase contrast can be extended to the information limit, with R = 0.35 nm. For the CM 200 C s = 43 fim and Z = −12 nm still produces a high level of phase contrast, comparable with the extended Scherzer pass-band, but with R = 0.08 nm only. in the latter mode Scherzer’s defocus equals Lichte's defocus of least confusion.

Correction of Spherical Aberration of a Medium Voltage TEM

Analysis and correction of spherical aberrations in long focal length measurements

Spherical Aberration Compensation Method for Long Focal-Length Measurement Based on Talbot Interferometry

Calibration for the Errors Resulted from Aberration in Long Focal Length Measurement

The Wavefront Aberration Analysis and Testing Accuracy Evaluation for the Large Aberration Aspheric System Based on the Best Fit Sphere

Aberration Calibration in High-Na Spherical Surfaces Measurement on Point Diffraction Interferometry

Calculation of Aberration Fields for Freeform Imaging Systems Using Field-Dependent Footprints on Local Tangent Planes.

Spherical aberration correction in a scanning transmission electron microscope using a sculpted foil

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Aberration Correction Method for the Catadioptric Imaging System Design.

Catadioptric aberration correction in cathode lens microscopy

Correction Algorithms of Pupil Aberration for Fourier Ptychographic Microscopy

High-Resolution Imaging with an Aberration-Corrected Transmission Electron Micrscope

Applications of Aberration Corrected TEM and Exit Wavefunction Reconstruction to Materials Science

Automatic Lens Splitting Optimization Algorithm Forspherical Aberration Correction

Aberration Correction Method Based on Double-Helix Point Spread Function

High Order Aberrations Calculation of A Hexapole Corrector Using A Differential Algebra Method

Aberration corrected STEM by means of diffraction gratings

Numerical Analysis of a Novel Two-Stage Enlargement and Adaptive Correction Approach for the Annular Aberration Compensation

Correction: Optofluidic Lens with Low Spherical and Low Field Curvature Aberrations

New correction method for transmission-type misalignment optical system based on aberration theory