Abstract:The physical response of photorefractive materials under inhomogeneous illumination is well described by using material equations. Usual solutions to material equations are based on the assumption that the light modulation is small enough to linearize the equations. However, large light modulation, the presence of applied electric field and short time pulses are always required in many applications. A few analytical approaches and numerical solutions are developed for large light modulation. But certain simplifications are applied to the set of material equations and large computational effort is required. In this paper we present a numerical approach based on method of lines for simulating the photorefractive kinetics at high light modulation with an applied electric field. No approximations are made during the simulation and less effort is required during computation. We use different values of light modulation and applied electric field to present the numerical results. Time-space distribution of the carrier density and the space charge field, field amplitude evolution are obtained. Compared to the results under the small light modulation approximation, this method helps to understand the dynamics of photorefractive grating formation at high light modulation. A comparison is also made between the coupling coefficient obtained by this numerical method and that by analytical expressions.

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