Effects of N~+ implantation on polysaccharide and osmosis stress resistance of liquorice

WEI Shenglin,WU Lijun,YU Zengliang
DOI: https://doi.org/10.3969/j.issn.1000-3436.2007.05.004
2007-01-01
Journal of Radiation Research and Radiation Processing
Abstract:In order to study the effects of N~+ implantation on osmosis stress resistance of plant,the experiment was taken with liquorice as plant model and 15% PEG as the osmosis stress agent.The results showed that the stem height growth of liquorice increased by 40.2% compared with controls(p<0.01 and internal polysaccharide in leaves increased by 84.8%(p<0.01 after 20keV nitrogen ions implanted.The stem height growth showed evidently the posi- tive correlation with the in internal polysaccharide in leaves under osmosis stress(r=0.7166,p<0.01)The selected N~+ implantation parameters may be useful to increase osmosis stress resistance cultivation of liquorice and to make it mutatedwith ions beam implanation.
What problem does this paper attempt to address?