Effect of Atomic Diagonal Motion on Cluster Diffusion Coefficient and Its Scaling Behavior

XP Wang,F Xie,QW Shi,TX Zhao
DOI: https://doi.org/10.1016/j.susc.2004.05.004
IF: 1.9
2004-01-01
Surface Science
Abstract:The effect of atomic diagonal motion on the cluster diffusion and its size dependence is simulated by kinetic Monte Carlo method. The diffusion coefficient D(N) of a cluster with size N satisfies a power law D(N)∝N−α, where the scaling exponent α decreases with the increase of additive diagonal motion barrier Ed. When Ed is very small, the cluster diffusion is dominantly controlled by periphery diffusion mechanism and α is found to be about 1.5. On the contrary, when Ed is very large, the cluster diffusion is mainly controlled by the correlation evaporation and condensation (CEC) mechanism and α approaches 1.0. Furthermore, a threshold Edt∼0.4E0 (E0 is the diffusion barrier for a free adatom), corresponding to the transition of different dominant mechanisms for the cluster diffusion, is found existing in the relationship between D and Ed. When EdEdt, the CEC mechanism is more important, and D is nearly independent of Ed. Additionally, the temperature dependent of D is found to be D∼exp(−EakBT) and the active energy Ea is found to ∼1.42E0.
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