Structure and Tribology Property of Carbon Nitride Films Deposited by Mw-Ecr Plasma Enhanced Unbalanced Magnetron Sputtering

J Xu,P Gao,Wy Ding,X Li,Xl Deng,C Dong

DOI: https://doi.org/10.1088/1009-0630/8/4/12

2006-01-01

Abstract:Amorphous carbon nitride thin films were prepared by plasma-enhanced DC magnetron sputtering using twinned microwave electron cyclotron resonance plasma sources. Chemical structure of deposited films was investigated using X-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy. The results indicate that the deposition rate is strongly affected by direct current bias, and the films are mainly composed of a single amorphous carbon nitride phase with N/C ratio close to C3N4, and the bonding is predominantly of C-N type.