Formation of 1,2,4-Trisilacyclopentanes by Photolysis of FpCH<sub>2</sub>SiR<sub>2</sub>SiR<sub>2</sub>SiR<sub>2</sub>CH<sub>2</sub>Fp (Fp = (η<sup>5</sup>-C<sub>5</sub>H<sub>5</sub>)Fe(CO)<sub>2</sub>)

Yongqiang Zhang,Keith H. Pannell
DOI: https://doi.org/10.1021/om0109657
2002-01-01
Organometallics
Abstract:Photolysis of FpCH(2)SiMe(2)SiMe(2)SiMe(2)CH(2)Fp (1), Fp = [(eta(5)-C5H5)Fe(CO)(2)], resulted in almost quantitative formation of 1,1,2,2,4,4-hexamethyl-1,2,4-trisilacyclopentane (2) and Fp(2). Similar treatment of FpCH(2)Me(2)SiMeSiEtSiMe(2)CH(2)Fp (6) afforded 1-ethyl-1,2,2,4,4-pentamethyl-1,2,4-trisilacyclopentane (7), indicating that the central silicon of the trisilane remains associated with the silicon-silicon bond of the product. Irradiation of FpCH(2)PhMeSiSiMe(2)SiMe(2)CH(2)Fp (11) led to the formation of the two positional isomers (ratio 4:3), 1,1,2,2,4-heptamethyl-4-phenyl-1,2,4-trisilacyclopentane (12a) and 1,1,2,4,4-heptamethyl2-phenyl-1,2,4-trisilacyclopentane (12b), indicating that either one of the two terminal silicon atoms of the trisilane remains in the Si-Si bond of the product while the other becomes the silicon atom of the product at 4-position. A mechanism for the formation of 1,2,4-trisilacyclopentane is suggested. Irradiation of 11 also produced a small amount the rearranged product FpPhMeSiCH(2)SiMe(2)CH(2)SiMe(2)Fp (13), whereas photochemical treatment of the tetrasilane analogue, FpCH(2)SiMe(2)SiMe(2)SiMe(2)SiMe(2)CH(2)Fp (15), resulted in only the high-yield rearrangement product FpMe(2)SiCH(2)SiMe(2)SiMe(2)CH(2)SiMe(2)Fp (17) with an absence of elimination products.
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