In-Situ Measurement of Molecular Orientation of the Pentacene Ultrathin Films Grown on Sio2 Substrates

Genki Yoshikawa,Tetsuhiko Miyadera,Ryo Onoki,Keiji Ueno,Ikuyo Nakai,Shiro Entani,Susumu Ikeda,Dong Guo,Manabu Kiguchi,Hiroshi Kondoh,Toshiaki Ohta,Koichiro Saiki
DOI: https://doi.org/10.1016/j.susc.2006.04.012
IF: 1.9
2006-01-01
Surface Science
Abstract:Molecular orientations of pentacene ultrathin films grown on SiO2 substrates were studied without the influence of the atmosphere by vacuum atomic force microscopy (V-AFM) and near edge X-ray absorption fine structure (NEXAFS). The experimental processes from deposition of pentacene to characterization of films were performed under vacuum condition without exposure to the atmosphere. V-AFM and NEXAFS measurements showed that pentacene molecules tend to grow on SiO2 surface with their molecular long axes perpendicular to the substrate surfaces (standing-mode) irrespective of preparation procedure of SiO2 substrate.
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