Tailoring Spectral Position and Width of Field Enhancement by Focused Ion‐beam Patterning of Plasmonic Nanoparticles

Lorenzo Rosa,Kai Sun,Joanna Szymanska,Fay E. Hudson,Andrew Dzurak,Andre Linden,Sven Bauerdick,Lloyd Peto,Saulius Juodkazis
DOI: https://doi.org/10.1002/pssr.201004239
2010-01-01
Abstract:We propose to use ion-beam patterning of plasmonic nanoparticles made by standard electron beam lithography, plasmonic metal deposition, and lift-off sequence. With this approach new three-dimensional (3D) tailoring of nanoparticles becomes possible: cut through the particle and into the substrate, cut-through at an angle, trim or bore nanoparticles or substrate. Here, we numerically simulate the expected optical properties of such 3D patterned nanoparticles. We show a particular case when spectrally broad extinction band can be created with a strong light field enhancement on a Si substrate.[GRAPHICS]Nanoparticles with a 10-20 nm nano-gap cut by ion-beam at the chosen location and to the required depth into the substrate. Scanning electron microscopy (SEM) image of the fabricated Au-nanoparticles. (C) 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
What problem does this paper attempt to address?