Interfacial magnetic coupling in Co/antiferromagnetic van der Waals compound FePS 3
Alltrin Dhanarajgopal,Po-Chun Chang,Shi-Yu Liu,Tzu-Hung Chuang,Der-Hsin Wei,Chien-Cheng Kuo,Chia-Nung Kuo,Chin Shan Lue,Wen-Chin Lin
DOI: https://doi.org/10.1016/j.apsusc.2021.150864
IF: 6.7
2021-11-01
Applied Surface Science
Abstract:In this study, a Co-thin film was deposited on the van der Waals compound of FePS 3 for the investigation of interfacial magnetic coupling, which is crucial to the application in spintronic devices. As characterized by atomic force microscopy, the exfoliated FePS 3 surface was composed of defects within ± 1 monolayer height. The Co thin film covered the FePS 3 substrate uniformly with a roughness within ± 0.5 nm. The 2 nm-Pd/7 nm-Co/FePS 3 exhibited isotropic magnetism in the surface plane and the magnetic coercivity drastically decreased by more than 50% when the temperature was elevated from 85 K to 110–120 K, which is nearly the Néel temperature of FePS 3 . This observation indicates the interfacial magnetic coupling between Co and FePS 3 . The Co/FePS 3 magnetic coupling is robust even after annealing up to 200 °C. Furthermore, the measurement of X -ray magnetic circular dichroism confirmed the presence of non-compensated Fe moment along the in-plane direction is parallel to the Co magnetization direction. The net Fe-moment is supposed to play an essential role in mediating the magnetic coupling between the in-plane ferromagnetic Co and the perpendicular antiferromagnetic FePS 3 .
chemistry, physical,physics, applied, condensed matter,materials science, coatings & films