A novel chamber scheduling method in etching tools using adaptive neural networks

Hua Xu,Peifa Jia,Xuegong Zhang
DOI: https://doi.org/10.1007/11427469_144
2005-01-01
Abstract:Chamber scheduling in etching tools is an important but difficult task in integrated circuit manufacturing. In order to effectively solve such combinatorial optimization problems in etching tools, this paper presents a novel chamber scheduling approach on the base of Adaptive Artificial Neural Networks (ANNs). Feed forward, multi-layered neural network meta-models were trained through the back-error-propagation (BEP) learning algorithm to provide a versatile job-shop scheduling analysis framework. At the same time, an adaptive selection mechanism has been extended into ANN. By testing the practical data set, the method is able to provide near-optimal solutions for practical chamber scheduling problems, and the results are superior to those generated by what have been reported in the neural network scheduling literature.
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