Abstract:High-power impulse magnetron sputtering (HiPIMS), a new physical vapor deposition technique which combines the advantages of the high ionization rates of the sputtered materials and control of electromagnetism, has been widely used to deposit high-performance coatings with a large density and high adhesion. However, HiPIMS has some intrinsic disadvantages such as the low deposition rate, unstable discharge, and different ionization rates for different materials thereby hampering wider industrial adoption. We have recently designed an optimized cylindrical source based on the hollow cathode effect to circumvent the aforementioned limitations. However, during the operation of the cylindrical source, the discharge is inhomogeneous and the etching stripes are nonuniform. In order to determine the underlying mechanism and optimize the electromagnetic control, the discharge in the HiPIMS cylindrical source is simulated. The tangential magnetic field distribution on the target surface of the cylindrical sputtering source is inhomogeneous and electron runaway is serious, resulting in a relatively low plasma density. Two solutions are proposed to improve the situations. The first one is electrical improvement by installing an electron blocking plate, and the second one is magnetic improvement by adding compensating magnets. Our simulation results of the first method show that a potential well is produced by the electron blocking plate to suppress electron runaway and the plasma density is improved significantly, especially around the central cross-section of the cylindrical sputtering source. The discharge becomes homogeneous, and the etching stripes are uniform albeit not full enough. The second method of magnetic improvement significantly improves the homogeneity of the tangential magnetic field distribution on the target surface and the target utilization rate. After adding the optimized compensating magnets, the shape of the effective area (the value of the tangential magnetic field in a range of 25-50 mT) on the target surface can be controlled and made zonal. The target utilization rate increases to over 80% from 60%. In order to obtain the optimal conditions, the two techniques are combined. A larger and more homogeneous etching ring is observed by adopting both the electrical and magnetic improvements as predicted and explained by the simulation results. It can be concluded that the combination of the two improvement techniques can improve and optimize the HiPIMS cylindrical source.

Plasma characteristics in deep oscillation magnetron sputtering of chromium target

Global model on oscillation discharge characteristics during deep oscillation magnetron sputtering of Cr target

A hybrid plasma model for Cr thin film deposition by deep oscillation magnetron sputtering

Influence of magnetic field strength on plasma, microstructure, and mechanical properties of Cr thin films deposited by MPPMS and DOMS

Phasic Discharge Characteristics in High Power Pulsed Magnetron Sputtering

Discharge and Deposition Characteristics of High-Power Impulse Magnetron Sputtering Using Various Target Materials

Nano-second temporal particle behavior in high-power impulse magnetron sputtering discharge in a cylindrical cathode

Hollow cathode effect modified time-dependent global model and high-power impulse magnetron sputtering discharge and transport in cylindrical cathode

Magnetic Field Optimization and High-Power Discharge Characteristics of Cylindrical Sputtering Cathode

HIGH POWER PULSED MAGNETRON SPUTTERING DISCHARGE BEHAVIOR OF VARIOUS TARGET MATERIALS

Time-of-flight mass spectrometry diagnostics in deep oscillation magnetron sputtering (DOMS) of titanium

Modeling of Micro- and Nanoparticle Characteristics in DC Suspension Plasma Spray

Modeling and Plasma Characteristics of High-Power Direct Current Discharge

Origin of the energetic ions at the substrate generated during high power pulsed magnetron sputtering of titanium

Effect of Peak Power in Deep Oscillation Magnetron Sputtering on Film Properties

Simulation Study on Plasma Discharge and Transport in Cylindrical Cathode Controlled by Expanding Electromagnetic Field

Electromagnetic Control and Optimization of High Power Impulse Magnetron Sputtering Discharges in Cylindrical Source

Effects of Capacitively-Coupled Radio-Frequency Discharge on Operation Voltage in Magnetron Sputtering

Effect of Synthesis Conditions on Discharge Behavior of Magnetic Field Enhanced High Power Impulse Magnetron Sputtering

Dynamics and impurity spectral characteristics of coaxial gun discharge plasma

High power fast pulsed magnetron discharges