Ultrasensitive and broadband MoS2 photodetector driven by ferroelectrics

Xudong Wang,Peng Wang,Jianlu Wang,Weida Hu,Xiaohao Zhou,Nan Guo,Hai Huang,Shuo Sun,Hong Shen,Tie Lin,Minghua Tang,Lei Liao,Anquan Jiang,Jinglan Sun,Xiangjian Meng,Xiaoshuang Chen,Wei Lu,Junhao Chu

DOI: https://doi.org/10.48550/arXiv.1502.04439

2015-02-16

Mesoscale and Nanoscale Physics

Abstract:Photodetectors based on two dimensional materials have attracted growing interest. However, the sensitivity is still unsatisfactory even under high gate voltage. Here we demonstrate a MoS2 photodetector with a poly(vinylidene fluoride-trifluoroethylene) ferroelectric layer in place of the oxide layer in a traditional field effect transistor. The dark current of the photodetector is strongly suppressed by ferroelectric polarization. A high detectivity 2.21012 Jones) and photoresponsitivity (2570 A W) detector has been achieved under ZERO gate bias at a wavelength of 635 nm. Most strikingly, the band gap of few-layer MoS2 can be tuned by the ultra-high electrostatic field from the ferroelectric polarization. With this characteristic, photoresponse wavelengths of the photodetector are extended into the near infrared (0.85-1.55m). A ferroelectrics optoelectronics hybrid structure is an effective way to achieve high performance 2D electronic optoelectronic devices.