Transition metal Co induce CoSe 2 /NiWSe 2 interface structural reorganization for efficient oxygen evolution reaction and urea oxidation reaction.

Kankan Liu,Jing Cheng,Yimiao Yu,Zhaohui Sui,Fengbo Guo,Shiwen Lei,Lixin Zhang,Meng Li,Yanbin Yun
DOI: https://doi.org/10.1016/j.surfin.2024.103950
IF: 6.2
2024-01-22
Surfaces and Interfaces
Abstract:Urea-containing wastewater has become an increasingly serious environmental and energy problem. The use of electrochemical urea oxidation reaction (UOR) technology to treat wastewater containing urea has gained considerable significance. The regulation of the composition and electronic properties of the catalyst by doping transition metal elements is crucial for the development of oxygen evolution reaction (OER) and UOR catalysts with high catalytic activity. In this paper, WSe 2 , CoSe 2 , NiWSe 2 and CoSe 2 /NiWSe 2 were synthesized by hydrothermal method combined with annealing treatment. Compared with WSe 2 , CoSe 2 , and NiWSe 2 , the OER and UOR catalytic activity of CoSe 2 /NiWSe 2 are significantly improved. For OER, a low overpotential of 1.44 V is all that is needed to reach a current density of 10 mA cm −2 . The overpotential of UOR is only 1.32 @ 10 mA cm −2 , and it can still maintain excellent electrochemical stability after 30 h. The electronic structure of CoSe 2 /NiWSe 2 is changed by the incorporation of Co, thereby improving the conductivity and accelerating the reaction kinetics. CoSe 2 particles are uniformly distributed on the layered NiWSe 2 nanosheets, which promotes the charge transfer and synergistic effect at the interface between CoSe 2 and NiWSe 2 . The nanoflower-like structure with thin edges enriches the active sites of CoSe 2 /NiWSe 2 . Therefore, the transition metal element doping technology can provide a new method for the development of efficient OER and UOR electrocatalysts and provide a new way to reduce the overall energy consumption during urea degradation.
chemistry, physical,physics, applied, condensed matter,materials science, coatings & films
What problem does this paper attempt to address?